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卢红亮
发表时间:2015-09-21 阅读次数:12621次

基本资料

    籍贯:浙江金华
    职称:教授,博士生导师
    地址:上海市邯郸路220号,复旦大学微电子楼B212室
    电话:021-65642457
    Email:honglianglu@fudan.edu.cn

教育与工作经历

  1. 2003~2006  复旦大学微电子学系,博士
  2. 2006~2007  意大利微电子材料与器件国家实验室,博士后研究员
  3. 2007~2009  日本东京大学电气工程系,日本学术振兴会JSPS研究员
  4. 2010~至今   复旦大学微电子学院,副教授、教授

        2006年7月毕业于复旦大学微电子系,获得微电子学与固体电子学博士学位,并获得上海市优秀毕业生称号。2006年11月至2007年10月,作为一名博士后人员,受邀进入到意大利微电子材料和器件(MDM)国家实验室继续进行半导体材料和工艺技术方面的研究。2007年至2009年,获得日本学术振兴协会(JSPS)的资助,作为外国人特别研究员,进入到东京大学电气工程系进行为期2年的学术研究。2010年7月,进入复旦大学微电子学院工作,任副教授、教授,主要的研究方向为应用于下一代集成电路工艺的新型半导体材料与器件。在此期间,作为第一负责人,承担多项研究课题,并已在国内外期刊发表学术论文98篇,其中SCI收录70篇,EI收录55篇,申请国内专利21项,并为Nanoscale, Scientific Reports, Applied Physics Letters, Chemistry of Materials等国际期刊审稿。现为IEEE会员,中国ALD学术会议秘书长,上海市真空协会常务理事,上海市电子学会会员,2015年度复旦大学卓学计划,2015年度复旦大学青年研究创新项目-学术带头人,2017年度上海市真空青年创新奖。

研究方向

  1. 先进集成电路工艺,如原子层淀积(ALD)纳米级功能薄膜;
  2. 高迁移率半导体器件,如III-V基、ZnO基、Si纳米线晶体管;
  3. 新型宽禁带半导体材料与器件,如AlN、金刚石等薄膜及器件制备;
  4. 基于微纳结构的新型NEMS器件,如光电、气体、生物传感器及能源器件。

承担项目

  1. 国家重点研发计划(2016YFEXXXX);
  2. 国家自然科学基金(61376008);
  3. 国家自然科学基金(51102048);
  4. 国家科技重大专项(2011ZX02702-002);
  5. 国家863项目计划子课题;
  6. 教育部博士点专项科研基金资助课题(20110071120017);
  7. 上海市教育委员会科研创新项目(14ZZ004)
  8. 专业集成电路与系统(ASIC)国家重点实验室自主课题(11MS017);
  9. 复旦大学自主创新科研项目;
  10. 复旦大学人才引进启动资金;
  11. 复旦大学卓学计划

在读学生

  1. 博士生:2014级:陈宏彦,任青华;2015级:王韬,袁凯平,张岩; 2016级:陈金鑫
  2. 硕士生:2014级:顾雨竹,孙龙
  3. 本科生:2012级:徐振誉(2015年望道学者);2013级:顾洋;2014级:朱立远(2016年莙政学者, 2017年复旦大学腾飞杯获得者),李欣羽

 毕业学生

  1. 博士生:2012级:耿阳,张远 
  2. 硕士生:2010级:郭立,陈佳,孙宁;2011级:谢章熠,谢立恒;2012级:朱尚斌;2013级:王韬
  3. 本科生:2012级:徐振誉(2015年望道学者,在UCLA读研)

      

      欢迎校内外有志于新型微纳电子器件(特别是传感器、晶体管、能源器件领域)研发,具有相关专业背景的本科生、研究生及博士后加入小组,特别欢迎具有物理、化学、材料、光电及生物医学等跨学科背景的优秀学子们,请联系honglianglu@fudan.edu.cn。

 

代表性著作/论文

  1. Hong-liang Lu (卢红亮), David Wei Zhang (张卫), Chapter 2“Issues in High-k Gate Dielectrics and its Stack Interfaces”, in Book “High-k Gate Dielectrics for CMOS Technology”, Wiley-VCH, Germany, 2012.

               2017年

  1. Kaiping Yuan, Qi Cao, Hong-Liang Lu*, Miao Zhong, Xiuzhen Zheng, Hong-Yan Chen, Tao Wang, Jean-Jacques Delaunay, Wei Luo, Liwu Zhang, Yuan-Yuan Wang, Yonghui Deng, Shi-Jin Ding, and David Wei Zhang*, Oxygen-deficient WO3–x@TiO2–x core-shell nanosheets for efficient photoelectrochemical oxidation of neutral water solutions, Journal of Materials Chemistry A, (2017)
  2. Wen-Jun Liu, You-HangWang, Li-Li Zheng, Hong-Liang Lu, Shi-Jin Ding*, Stability enhancement of low temperature thin-film transistors with atomic-layer-deposited ZnO:Al channels, Microelectronic Engineering, 167, 105-109 (2017).
  3. Long Sun, Hong-Liang Lu*, Hong-Yan Chen, Tao Wang, Xin-Ming Ji, Wen-Jun Liu, Dongxu Zhao, Anjana Devi, Shi-Jin Ding, David Wei Zhang, Effects of post annealing treatments on the interfacial chemical properties and band alignment of AlN/Si structure prepared by atomic layer deposition, Nanoscale Research Letters, 12, 102 (2017).

               2016年

  1. Hong-Yan Chen, Hong-Liang Lu*, Long Sun, Qing-Hua Ren, Hao Zhang, Xin-Ming Ji, Wen-Jun Liu, Shi-Jin Ding, Xiao-Feng Yang, and David Wei Zhang*, Realizing a facile and environmental-friendly fabrication of high-performance multi-crystalline silicon solar cells by employing ZnO nanostructures and an Al2O3 passivation layer, Scientific Reports, 6, 38486 (2016).
  2. Bo Peng, Hao Zhang, Hezhu Shao, Hongliang Lu, David Wei Zhang, and Heyuan Zhu, High thermoelectric performance of Weyl semimetal TaAs, Nano Energy, 30, 225 (2016).
  3. Bo Peng, Hao Zhang, Hezhu Shao, Yuanfeng Xu, Rongjun Zhang, Hongliang Lu, David Wei Zhang, and Heyuan Zhu, First-principles prediction of ultralow lattice thermal conductivity of dumbbell silicene: A comparison with low-buckled silicene, ACS Appl. Mater. Interfaces, 8, 20977 (2016).
  4. Yuan Zhang, Hong-Liang Lu,* Tao Wang, Qing-Hua Ren, Hong-Yan Chen, Hao Zhang, Xin-Ming Ji, Wen-Jun Liu, Shi-Jin Ding, and David Wei Zhang, Photoluminescence enhancement of ZnO nanowire arrays by atomic layer deposition of ZrO2 layers and thermal annealing, Physical Chemistry Chemical Physics, 18, 16377 (2016).
  5. Lei Wei, Qi-Xuan Liu, Bao Zhu, Wen-Jun Liu, Shi-Jin Ding*, Hong-Liang Lu, Anquan Jiang, and David Wei Zhang, Low-cost and high-productivity three-dimensional nanocapacitors based on stand-up ZnO nanowires for energy storage, Nanoscale Research Letters, 11, 213 (2016).
  6. You-Hang Wang, Qian Ma, Li-Li Zheng, Wen-Jun Liu, Shi-Jin Ding, Hong-Liang Lu, David Wei Zhang, Performance Improvement of Atomic Layer-Deposited ZnO/Al2O3 Thin-Film Transistors by Low-Temperature Annealing in Air, IEEE Transactions on Electron Device, 63, 1893 (2016).
  7. Qing-Hua Ren, Yan Xu, Hong-Liang Lu*, Hong-Yan Chen, De-Hui Li, Wen-Jiu Liu, Shi-Jin Ding, An-Quan Jiang, and David Wei Zhang, Surface-plasmon mediated photoluminescence enhancement of Pt-coated ZnO nanowires by inserting an atomic-layer-deposited Al2O3 spacer layer, Nanotechnology, 27, 165705 (2016).
  8. Jian-Shuang Liu, Hong-Liang Lu*, Sai-Sheng Xu, Peng-Fei Wang, Shi-Jin Ding, David Wei Zhang, Influence of NH3 annealing on the chemical states of HfO2/Al2O3 stacks studied by X-ray photoelectron spectroscopy, Vacuum, 124, 60 (2016).
  9. Ji-Ping Xu, Rong-Jun Zhang, Yuan Zhang, Zi-Yi Wang, Lei Chen, Qing-Hua Huang, Hong-Liang Lu, Song-You Wang, Yu-Xiang Zheng, Liang-Yao Chen, The thickness-dependent band gap and defect features of ultrathin ZrO2 films studied by spectroscopic ellipsometry, Physical Chemistry Chemical Physics, 18, 3316 (2016).
  10. Victor Luo*, Xing-Tao Xue, Kuan-Chieh Yu, Meng Jin, Hong-Liang Lu*, David Wei Zhang, Method to Improve the Process Efficiency for Copper Pillar Electroplating, Journal of The Electrochemical Society, 163, E39 (2016).
  11. Wen-Jun Liu, Lin Chen, Peng Zhou, Qing-Qing Sun, Hong-Liang Lu, Shi-Jin Ding, David Wei Zhang, Chemical-Vapor-Deposited Graphene as Charge Storage Layer in Flash Memory Device, Jounal of Nanomaterials, 10, 6751497 (2016).

                  2015年及之前

  1. Yuan Zhang, Hong-Liang Lu*, Tao Wang, Qing-Hua Ren, Yu-Zhu Gu, De-Hui Li, and David Wei Zhang, Facile synthesis and enhanced luminescent properties of ZnO/HfO2 core-shell nanowires, Nanoscale, 7, 15462 (2015).
  2. Hong-Yan Chen, Hong-Liang Lu*, Qing-Hua Ren, Yuan Zhang, Xiao-Feng Yang, Shi-Jin Ding, and David Wei Zhang*, Enhanced photovoltaic performance of inverted pyramid-based nanostructured black-silicon solar cells passivated by an atomic-layer-deposited Al2O3 layer, Nanoscale, 7, 15142 (2015).
  3. Yu-Zhu Gu, Hong-Liang Lu,* Yuan Zhang,Peng-Fei Wang, Shi-Jin Ding,and David Wei Zhang, Effects of ZnO seed layer annealing temperature on the properties of n-ZnO NWs/Al2O3/p-Si hheterojunction, Optics Express, 23, 24456 (2015).
  4. Yang Geng, Wen Yang, Hong-Liang Lu*, Yuan Zhang, Qing-Qing Sun, Peng Zhou, Peng-Fei Wang, Shi-Jin Ding, and David Wei Zhang, Mobility Enhancement and OFF Current Suppression in Atomic-Layer-Deposited ZnO Thin Film Transistors by Post Annealing in O2, IEEE Electron Device Letters, 35, 1266, (2014).
  5. Hong-Liang Lu*, Zhang-Yi Xie, Yang Geng, Yuan Zhang, Qing-Qing Sun, Peng-Fei Wang, Shi-Jin Ding, David Wei Zhang, Growth and interfacial properties of atomic layer deposited Al0.7Ti0.3Oy high-k dielectric on Ge substrate, Applied Physics A-Materials Science & Processing,117, 1479, (2014).
  6. Hong-Liang Lu*, Yu-Zhu Gu, Yuan Zhang, Xin-Yan Liu, Peng-Fei Wang, Qing-Qing Sun, Shi-Jin Ding, and David Wei Zhang, Improved photoelectrical properties of n-ZnO/p-Si heterojunction by inserting an optimized thin Al2O3 buffer layer, Optics Express, 22 , 22184, (2014).
  7. Hong-Liang Lu*, Ming Yang, Zhang-Yi Xie, Yang Geng, Yuan Zhang, Peng-Fei Wang, Qing-Qing Sun, Shi-Jin Ding, and David Wei Zhang, Band alignment and interfacial structure of ZnO/Si heterojunction with Al2O3 and HfO2 as interlayers, Applied Physics Letters, 104, 161602, (2014).
  8. Qiu-Xiang Zhang, Bao Zhu, Shi-Jin Ding, Hong-Liang Lu, Qing-Qing Sun, Peng Zhou, and Wei Zhang, Full ALD Al2O3/ZrO2/SiO2/ZrO2/Al2O3 Stacks for High-Performance MIM Capacitors, IEEE Electron Device Letters, 35, 1121, (2014).
  9. Minghong Wang, Xiqing Wang, Qin Yue, Yu Zhang, Chun Wang, Jin Chen, Huaqiang Cai, Hongliang Lu, Ahmed A. Elzatahry, and Dongyuan Zhao, Templated fabrication of core-shell magnetic mesoporous carbon microspheres in 3-dimensional ordered macroporous silicas, Chemistry of Materials, 26, 3316, (2014).
  10. Yu-Zhu Gu, Hong-Liang Lu*, Yang Geng, Zhi-Yuan Ye, Yuan Zhang, Qing-Qing Sun, Shi-Jin Ding, and   David Wei Zhang, Optical and microstructural properties of ZnO/TiO2 nanolaminates prepared by atomic layer deposition, Nanoscale Research Letters, 8, 107 (2013).
  11. Zhi-Yuan Ye, Hong-Liang Lu*, Yang Geng, Yu-Zhu Gu, Zhang-Yi Xie, Yuan Zhang, Qing-Qing Sun, Shi-Jin Ding, and David Wei Zhang, Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer deposition, Nanoscale Research Letters, 8, 108 (2013).
  12. Shang-Bin Zhu, Yang Geng, Hong-Liang Lu*, Yuan Zhang, Qing-Qing Sun, Shi-Jin Ding, and David Wei Zhang, Effects of rapid thermal annealing on Hf-doped ZnO films grown by atomic layer deposition, Journal of Alloys and Compounds, 577, 340 (2013).
  13. Jian-Shuang Liu, Yang Geng, Lin Chen, Qing-Qing Sun, Peng Zhou, Hong-Liang Lu*, and David Wei Zhang, Nitridation of atomic-layer-deposited HfO2/Al2O3 stacks by NH3 annealing, Thin Solid Films, 529, 230 (2013).
  14. Yang Geng, Zhang-Yi Xie, Wen Yang, Sai-Sheng Xu, Qing-Qing Sun, Shi-Jin Ding, Hong-Liang Lu*, and David Wei Zhang,  Structural, Optical, and Electrical Properties of Hf-doped ZnO Films Deposited by Atomic Layer Deposition, Surface & Coatings Technology, (2013).
  15. Yang Geng, Zhang-Yi Xie, Sai-Sheng Xu, Qing-Qing Sun, Shi-Jin Ding, Hong-Liang Lu*, and David Wei Zhang, Effects of Rapid Thermal Annealing on Structural, Luminescent, and Electrical Properties of Al-Doped ZnO Films Grown by Atomic Layer Deposition, ECS Journal of Solid State Science and Technology, 1, N45 (2012).
  16. Zhang-Yi Xie, Hong-Liang Lu*, Sai-Sheng Xu, Yang Geng, Qing-Qing Sun, Shi-Jing Ding, and David Wei Zhang, Energy band alignment of InGaZnO4/Si heterojunction determined by x-ray photoelectron spectroscopy, Applied Physics Letters, 101, 252111 (2012).
  17. Lu-Hao Wang, Wen Yang, Qing-Qing Sun, Peng Zhou, Hong-Liang Lu, Shi-Jin Ding, and David Wei Zhang, The mechanism of the asymmetric SET and RESET speed of graphene oxide based flexible resistive switching memories, Applied Physics Letters, 100, 063509 (2012).
  18. Jian-Shuang Liu, Yan Xu, Qing-Qing Sun, Hongliang Lu*, and David Wei Zhang, Characterizations of NbAlO thin films grown by atomic layer deposition, Materials Letters, 65, 2182 (2012).
  19. Yang Geng, Li Guo, Sai-Sheng Xu, Qing-Qing Sun, Shi-Jin Ding, Hong-Liang Lu*, and David Wei Zhang*, Influence of Al Doping on the Properties of ZnO Thin Films Grown by Atomic Layer Deposition, Journal of Physics Chemistry C, 115,12317 (2011).
  20. Lin Chen, Hong-Yan Gou, Qing-Qing Sun, Peng Zhou, Hong-Liang Lu, Peng-Fei Wan, Shi-Jin Ding, and David Wei Zhang, Enhancement of Resistive Switching Characteristics in Al2O3-Based RRAM With Embedded Ruthenium Nanocrystals, IEEE Electron Device Letters, 32, 794 (2011).
  21. Hong-Liang Lu, Shi-Jin Ding, and David Wei Zhang, Investigation of Thermal Stability of Atomic-Layer-Deposited MgO Thin Films on Si(100) Using X-Ray Photoelectron Spectroscopy, Electrochemical and Solid-State Letters, 13, G25, (2010).
  22. Hong-Liang Lu, Xiao-Liang Wang, Masakazu Sugiyama, and Yukihiro Shimogaki, Investigation on GaAs surface treated with dimethylaluminumhydride, Applied Physics Letters, 95, 212102, (2009).
  23. Hong-Liang Lu, Yuki Terada, Yukihiro Shimogaki, Yoshiaki Nakano, and Masakazu Sugiyama, In situ passivation of InP surface using H2S during metal organic vapor phase epitaxy, Applied Physics Letters, 95, 152103, (2009).
  24. Hong-Liang Lu, Shi-Jin Ding, and David Wei Zhang, Density functional theory study on the reaction mechanisms of bis(cyclopentadienyl) magnesium with hydrogenated and hydroxylated Si (100)-(2×1) surfaces, Journal of Physics Chemistry A, 113, 8791, (2009).
  25. H. L. Lu, G. Scarel, C. Wiemer, M. Perego, S. Spiga, M. Fanciulli, and G. Pavia, Atomic Layer Deposition of NiO Films on Si(100) Using Cyclopentadienyl-Type Compounds and Ozone as Precursors, Journal of The Electrochemical Society, 155, H807, (2008).
  26. H. L. Lu, G. Scarel, M. Alia, M. Fanciulli, S.J. Ding, and D.W. Zhang, Spectroscopic ellipsometry study of thin NiO films grown on Si(100) by atomic layer deposition, Applied Physics Letters, 92, 222907, (2008).
  27. A. Lamperti, S. Spiga, H. L. Lu, C. Wiemer, M. Perego, E. Cianci, M. Alia, and M. Fanciulli, Study of the interfaces in resistive switching NiO thin films deposited by both ALD and e-beam coupled with different electrodes (Si, Ni, Pt, W, TiN), Microelectronic Engineering, 85, 2425-2429, (2008).
  28. S. Schamm, P.E. Coulon, S. Miao, S.N. Volkos, H. L. Lu, L. Lamagna, C. Wiemer, D. Tsoutsou, G. Scarel, and M. Fanciulli, Chemical/Structural Nanocharacterization And Electrical Properties of ALD-grown La2O3/Si Interfaces For Advanced Gate Stacks, Journal of The Electrochemical Society, 156, H1, (2008).
  29. Hong-Liang Lu, Min Xu, Shi-Jin Ding, Wei Chen, David Wei Zhang, and Li-Kang Wang, X-ray reflectometry and spectroscopic ellipsometry characterization of Al2O3 atomic layer deposition on HF-last and NH3 plasma pretreatment Si substrates, Journal of Material Research, 22, 1214, (2007).
  30. Qing-Qing Sun, Wei Chen, Shi-Jin Ding, Min Xu, Hong-Liang Lu, Hans-Cristian Lindh-Rengifo, David Wei Zhang, and Li-Kang Wang, Comparative study of passivation mechanism of oxygen vacancy with fluorine in HfO2 and HfSiO4, Applied Physics Letters, 90, 142904, (2007).
  31. Hong-Liang Lu, Min Xu, Shi-Jin Ding, Wei Chen, David Wei Zhang, and Li-Kang Wang, Quantum chemical study of the initial surface reactions of HfO2 atomic layer deposition on the hydroxylated GaAs (001)-4×2 surface, Applied Physics Letters, 89, 162905, (2006).
  32. Hong-Liang Lu, Liang-Sun, Shi-Jin Ding, Min Xu, David Wei Zhang, and Li-Kang Wang, Characterization of Al2O3/GaAs interface improved by NH3 plasma pretreatment, Applied Physics Letters, 89, 152910, (2006).
  33. Hong-Liang Lu, Wei Chen, Shi-Jin Ding, Min Xu, David Wei Zhang, and Li-Kang Wang, Quantum chemical study of adsorption and dissociation of H2S on the Gallium-rich GaAs (001)-4×2 surface, Journal of Physical Chemistry B, 110, 9529, (2006).
  34. Wei Chen, Hong-Liang Lu, David Wei Zhang, Min Xu, Jie Ren, Jian-Yun Zhang, Ji-Tao Wang, and Li-Kong Wang, Density functional theory study of adsorption and dissociation of HfCl4 and H2O on Ge/Si(100) -2×1: Initial stage of atomic layer deposition of HfO2 on SiGe surface, Applied Physics Letters, 86, 142901, (2005).

 

 

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地址:上海市邯郸路220号 邮编:200433